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Proceedings Paper

Novel on-product focus metrology for EUV enabling direct focus monitoring and control for EUV systems
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Paper Abstract

In order to meet the tightened lithography performance requirement for EUV systems, a good on-product focus control with accurate metrology is essential. In this manuscript we report on a novel metrology solution for the EUV on-product focus measurement using YieldStar. The new metrology has been qualified on the Logic product wafers and when combined with the advanced techniques and algorithm shows a performance that is accurate and precise enough to meet EUV requirements. Furthermore, the new methodology provides the opportunity for on-product focus monitoring and control through different scanner interfaces. Here we present a case in which the Imaging Optimizer using the EUV metrology data shows an improvement of over 20% on the focus uniformity.

Paper Details

Date Published: 20 March 2020
PDF: 7 pages
Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 113251U (20 March 2020); doi: 10.1117/12.2553246
Show Author Affiliations
Inbeom Yim, Samsung Electronics Co., Ltd. (Korea, Republic of)
Koshiba Dakeshi, Samsung Electronics Co., Ltd. (Korea, Republic of)
Chan Hwang, Samsung Electronics Co., Ltd. (Korea, Republic of)
Seung Yoon Lee, Samsung Electronics Co., Ltd. (Korea, Republic of)
Jeongjin Lee, Samsung Electronics Co., Ltd. (Korea, Republic of)
Joonsoo Park, Samsung Electronics Co., Ltd. (Korea, Republic of)
Jenny Yueh, ASML (Netherlands)
Ali Ghavami, ASML (Netherlands)
Bart Segers, ASML (Netherlands)
Miguel Garcia Granda, ASML (Netherlands)
Yutao Gui, ASML (Netherlands)
Eric Janda, ASML (Netherlands)
Frank Staals, ASML (Netherlands)
Se-Hui Lee, ASML (Netherlands)
Seung-Bin Yang, ASML (Netherlands)
Yoon-Tae Lee, ASML (Netherlands)
Se-Ra Jeon, ASML (Netherlands)
Daniel Park, ASML (Netherlands)
Ewoud van West, ASML. (Netherlands)
Elliott McNamara, ASML (Netherlands)


Published in SPIE Proceedings Vol. 11325:
Metrology, Inspection, and Process Control for Microlithography XXXIV
Ofer Adan; John C. Robinson, Editor(s)

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