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Proceedings Paper

Influence of ion beam figuring (IBF) on reflectivity of monocrystalline silicon
Author(s): Gang Zhou; Ye Tian; Feng Shi; Ci Song; Hang Yuan; Yaoyu Zhong
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Paper Abstract

The rapid development of high-power optical system and free electron laser put higher request forward the reflectivity performance of monocrystalline silicon optical materials. In this paper, the surface characteristics of monocrystalline silicon elements before and after ion beam figuring are tested. Firstly, the photothermal absorption was measured at the infrared band of 1064 nm, which shows that the absorption amplitude of the processed region is higher than the other. Then, the power spectral density function(PSD) was used to compare the surface roughness in different frequency bands. And surface reflectivity of the processed infrared band is improved by 5% measured by spectrophotometer. The experimental results show that after ion beam figuring, the hydrolyzed layer of monocrystalline silicon optical element is exposed, and the absolute reflectivity and photothermal absorption performance are improved, which can improve the performance of optical element in high power laser system.

Paper Details

Date Published: 31 January 2020
PDF: 6 pages
Proc. SPIE 11427, Second Target Recognition and Artificial Intelligence Summit Forum, 1142747 (31 January 2020); doi: 10.1117/12.2553185
Show Author Affiliations
Gang Zhou, National Univ. of Defense Technology (China)
Hunan Key Lab. of Ultra-Precision Machining Technology (China)
Ye Tian, National Univ. of Defense Technology (China)
Hunan Key Lab. of Ultra-Precision Machining Technology (China)
Feng Shi, National Univ. of Defense Technology (China)
Hunan Key Lab. of Ultra-Precision Machining Technology (China)
Ci Song, National Univ. of Defense Technology (China)
Hunan Key Lab. of Ultra-Precision Machining Technology (China)
Hang Yuan, Shanghai Academy of Spaceflight Technology (China)
Yaoyu Zhong, National Univ. of Defense Technology (China)
Hunan Key Lab. of Ultra-Precision Machining Technology (China)


Published in SPIE Proceedings Vol. 11427:
Second Target Recognition and Artificial Intelligence Summit Forum
Tianran Wang; Tianyou Chai; Huitao Fan; Qifeng Yu, Editor(s)

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