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Proceedings Paper

On-product focus monitoring and control for immersion lithography in 3D-NAND manufacturing
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Paper Abstract

The market transition from 2D to 3D-NAND in recent years requires strict focus control and monitoring solutions. ASML’s μDBF targets (micro Diffraction Based Focus) enable on-product focus measurement which can be used to optimize scanner correction. Additionally, dense computational focus maps can be generated by combining μDBF measurements with scanner metrology such as non-correctable leveling error. This paper discusses the focus variability observed on memory layers through on product focus monitoring. This work will show how exposure at best focus can be performed for immersion lithography in the case of strong focus fingerprints. Focus monitoring data from μDBF and computational focus metrology will be used to generate and apply corrections on two 3D-NAND layers.

Paper Details

Date Published: 20 March 2020
PDF: 14 pages
Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 1132521 (20 March 2020); doi: 10.1117/12.2552930
Show Author Affiliations
Amine Lakcher, ASML Netherlands B.V. (Netherlands)
Ahmed Zayed, ASML Netherlands B.V. (Netherlands)
Jennifer Shumway, ASML Netherlands B.V. (Netherlands)
Jan-Pieter van Delft, ASML Netherlands B.V. (Netherlands)
Gratiela Isai, ASML Netherlands B.V. (Netherlands)
Ruxandra Mustata, ASML Netherlands B.V. (Netherlands)
Arno van den Brink, ASML Netherlands B.V. (Netherlands)
Taeddy Kim, ASML Korea (Korea, Republic of)
Jay Jung, ASML Korea (Korea, Republic of)
Yong-Sik Shin, ASML Korea (Korea, Republic of)
Soo-Kyung Lee, ASML Korea (Korea, Republic of)
Paul Böcker, ASML Netherlands B.V. (Netherlands)
Mohamed El Kodadi, ASML Netherlands B.V. (Netherlands)
Geert Vinken, ASML Netherlands B.V. (Netherlands)
ChanHa Park, SK Hynix (Korea, Republic of)
Sangjun Han, SK Hynix (Korea, Republic of)
Jeongsu Park, SK Hynix (Korea, Republic of)
Beomki Shin, SK Hynix (Korea, Republic of)
Gunwoong Lee, SK Hynix (Korea, Republic of)

Published in SPIE Proceedings Vol. 11325:
Metrology, Inspection, and Process Control for Microlithography XXXIV
Ofer Adan; John C. Robinson, Editor(s)

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