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Proceedings Paper

Atomic flux circuits
Author(s): Douglas G. Bopp; Ellyse Taylor; Khoa Le; Susan Schima; Matthew T. Hummon; John Kitching
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Paper Abstract

Atomic vapors are a crucial platform for precision metrology but in their simplest implementation, a thermal vapor, the intrinsic optical resonances are broadened due to the random and isotropic thermal motion of the atoms. By structuring the container of a thermal vapor with narrow emission apertures, the velocity distribution can be modified to create a directed beam of atoms.1 These atomic beams can then interact sequentially with a series of optical fields, or interaction zones, and ultimately allow precision control over the internal state of the atom. This is useful for optical frequency standards and precision spectroscopy2, 3 and may also provide the means to build a simple flying qubit platform.4 Furthermore, atomic beams on a chip can be used as a compact, directed source to load magneto-optical traps (MOTs) while minimally increasing the ambient pressure.5 We apply microfabrication techniques to microscopically structure silicon to deterministically control the ow of Rb between connected cavities. We describe a methodology to measure the experimental parameters that govern the flux of atomic vapors in these microfabricated structures with a goal of creating an equivalent electrical circuit model. This toolkit will provide a simple platform for the creation of atomic beams on a chip with controllable pressure profiles and a thorough understanding of the influence of adsorptive effects and pseudo- ballistic trajectories on the resultant atomic beam.

Paper Details

Date Published: 25 February 2020
PDF: 6 pages
Proc. SPIE 11296, Optical, Opto-Atomic, and Entanglement-Enhanced Precision Metrology II, 112961O (25 February 2020);
Show Author Affiliations
Douglas G. Bopp, National Institute of Standards and Technology (United States)
Univ. of Colorado (United States)
Ellyse Taylor, Brigham Young Univ. (United States)
Khoa Le, Univ. of Houston (United States)
Susan Schima, National Institute of Standards and Technology (United States)
Matthew T. Hummon, National Institute of Standards and Technology (United States)
John Kitching, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 11296:
Optical, Opto-Atomic, and Entanglement-Enhanced Precision Metrology II
Selim M. Shahriar; Jacob Scheuer, Editor(s)

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