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Proceedings Paper

Process variation-aware mask optimization with iterative improvement by subgradient method and boundary flipping
Author(s): Rina Azuma; Yukihide Kohira; Tomomi Matsui; Atsushi Takahashi; Chikaaki Kodama
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Paper Abstract

As one of Resolution Enhancement Techniques, a mask optimization such as Pixel-based Optical Proximity Correction or Inverse Lithography Technology is well discussed. In this paper, a pixel-based mask optimization using 0-1 Quadratic Programming problem (0-1 QP) is proposed to obtain enough image contour fidelity and tolerance to process variation in a short time. By formulating 0-1 QP to maximize intensity slope around between edges of target patterns, suppression of image contour distortion by the process variation is realized. The defined 0-1 QP is relaxed into Lagrangian relaxation problem and an approximate solution of the defined 0-1 QP is obtained by solving Lagrangian relaxation problem by using Subgradient method and gradient deciding method. Moreover, by applying a correction method which corrects boundary pixel of target patterns precisely into the mask obtained by 0-1 QP, enough shape fidelity toward target patterns can be obtained.

Paper Details

Date Published: 23 March 2020
PDF: 14 pages
Proc. SPIE 11328, Design-Process-Technology Co-optimization for Manufacturability XIV, 113280O (23 March 2020); doi: 10.1117/12.2552514
Show Author Affiliations
Rina Azuma, Univ. of Aizu (Japan)
Yukihide Kohira, Univ. of Aizu (Japan)
Tomomi Matsui, Tokyo Institute of Technology (Japan)
Atsushi Takahashi, Tokyo Institute of Technology (Japan)
Chikaaki Kodama, KIOXIA Corp. (Japan)

Published in SPIE Proceedings Vol. 11328:
Design-Process-Technology Co-optimization for Manufacturability XIV
Chi-Min Yuan, Editor(s)

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