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Proceedings Paper

Progress in availably of NXE:3400B EUVL sources in the field and power scaling towards 500W (Conference Presentation)
Author(s): David C. Brandt; Igor Fomenkov; Jayson Stewart

Paper Abstract

Multiple ASML’s NXE:3400B scanners are installed at the factories and slated to go to a high volume manufacturing (HVM) phase. The latest generation of the scanners NXE:3400C has an improved performance and availability also due to availability improvement of the EUV sources by implementing modularity concept. In this paper, we provide an overview of a tin laser-produced-plasma (LPP) extreme-ultraviolet (EUV) sources at 13.5nm enabling HVM at the N7 node and beyond. The field performance of the source at 250 watts power including the performance of subsystems such as the Collector and the Droplet Generator will be shown. Progress in the development of key technologies for power scaling towards 500W will be described.

Paper Details

Date Published: 24 March 2020
Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113230W (24 March 2020); doi: 10.1117/12.2552424
Show Author Affiliations
David C. Brandt, ASML US, Inc. (United States)
Igor Fomenkov, ASML US, Inc. (United States)
Jayson Stewart, ASML US, Inc. (United States)

Published in SPIE Proceedings Vol. 11323:
Extreme Ultraviolet (EUV) Lithography XI
Nelson M. Felix; Anna Lio, Editor(s)

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