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Proceedings Paper

Software-based optimization methods for the ULTRA semiconductor maskwriter (Conference Presentation)

Paper Abstract

This presentation introduces the technology and capabilities of the current ULTRA mask writer by Heidelberg Instruments and explains more in detail the possibilities to enhance the performance by introducing software-based optimizations with the MASKER and BEAMER software tools introduced by Genisys GmbH. We will discuss the results for CD linearity and CD uniformity accomplished by ULTRA, the feature fidelity correction and will also look at plans for further developments.

Paper Details

Date Published: 24 March 2020
Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113240O (24 March 2020); doi: 10.1117/12.2552378
Show Author Affiliations
Niels Wijnaendts van Resandt, Heidelberg Instruments Inc. (United States)
Ulrich Hofmann, GenISys GmbH (Germany)

Published in SPIE Proceedings Vol. 11324:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
Martha I. Sanchez; Eric M. Panning, Editor(s)

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