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Proceedings Paper

Roughness study on line and space patterning with chemo-epitaxy directed self-assembly
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Paper Abstract

For the introduction of directed self-assembly (DSA) process into high volume manufacturing, the roughness of pattern is one of main check points. The focus of this study is to understand the origin of DSA roughness and to discuss the strategies to improve DSA-specific roughness. 3X DSA LiNe flow with PS-b-PMMA was used as a model case. Unbiased line edge roughness (LER) and linewidth roughness (LWR) were measured using power spectral density (PSD) analysis on CDSEM images. We found that low frequency LER is particularly sensitive to the assembly conditions. By optimizing material and process conditions, unbiased LWR was reduced by about 10%, while unbiased LER was reduced by about 15%.

Paper Details

Date Published: 23 March 2020
PDF: 9 pages
Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 113260X (23 March 2020); doi: 10.1117/12.2552354
Show Author Affiliations
Hyo Seon Suh, imec (Belgium)
Viktor Dudash, imec (Belgium)
Taras Shevchenko National Univ. of Kyiv (Ukraine)
Gian Lorusso, imec (Belgium)
Chris Mack, Fractilia, LLC (United States)

Published in SPIE Proceedings Vol. 11326:
Advances in Patterning Materials and Processes XXXVII
Roel Gronheid; Daniel P. Sanders, Editor(s)

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