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Proceedings Paper

Proteus SMO for process window improvement
Author(s): Kun-Yuan Chen; Andy Lan; Richer Yang; Jing Jing Liu; Ting Ting Xu; Cheng-Shuan Lin; Hua Ding; Chih-Jie Lee; Thuc Dam; Jianjun Jia
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Paper Abstract

As technology continues to scale aggressively, source mask optimization (SMO) is now a key resolution enhancement technique (RET) to maximize the process window. Synopsys© has developed new source mask optimization tool Proteus SMO that demonstrated this improvement. Proteus SMO is equipped with comprehensive functionalities for computing the optimum source and mask. High flexibilities of source types, mask recipes, models, optimizers, and cost functions are provided. For enabling accurate simulation results, integration of Sentaurus Lithography (S-Litho) is also possible when needed. Moreover, the industrial-proven Inverse Lithography Technology (Proteus ILT) mask synthesis is integrated within Proteus SMO further maximizing the process window. Taking advantage of ILT and SLitho simulation solutions, Proteus SMO could achieve significant lithographic performance improvement.

Paper Details

Date Published: 23 March 2020
PDF: 9 pages
Proc. SPIE 11327, Optical Microlithography XXXIII, 1132711 (23 March 2020);
Show Author Affiliations
Kun-Yuan Chen, ChangXin Memory Technologies, Inc (China)
Andy Lan, ChangXin Memory Technologies, Inc. (China)
Richer Yang, ChangXin Memory Technologies, Inc. (China)
Jing Jing Liu, ChangXin Memory Technologies, Inc. (China)
Ting Ting Xu, ChangXin Memory Technologies, Inc. (China)
Cheng-Shuan Lin, Advanced Manufacturing EDA Co. Ltd. (China)
Hua Ding, Advanced Manufacturing EDA Co. Ltd. (China)
Chih-Jie Lee, Synopsys, Inc. (United States)
Thuc Dam, Synopsys, Inc. (United States)
Jianjun Jia, Synopsys, Inc. (United States)


Published in SPIE Proceedings Vol. 11327:
Optical Microlithography XXXIII
Soichi Owa, Editor(s)

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