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Proceedings Paper

Highly substituted fullerene-based spin-on organic hardmasks
Author(s): Alan G. Brown; Guy Dawson; Greg O'Callaghan; Carmen Popescu; Alexandra McClelland; Tom Lada; Bryan Schofield; Warren Montgomery; Alex P. G. Robinson
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Paper Abstract

Irresistible Materials has previously introduced the HM340 series of fullerene based spin-on carbon hardmasks, and reported on material characterization, including very high carbon content and high thermal stability. The materials have a low Ohnishi number providing high etch durability and the low hydrogen level allows for high resolution etching without wiggling. In order to further increase semiconductor facilities (Fab) compatibility, thermal stability and etch resistance several new formulations are under development. Here we present the latest results for our new HM1360 series, avoiding the drain test issues encountered with higher concentration HM340 formulations, together with new and updated characterisation results for the more advanced formulations.

Paper Details

Date Published: 23 March 2020
PDF: 7 pages
Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 1132618 (23 March 2020); doi: 10.1117/12.2552215
Show Author Affiliations
Alan G. Brown, Irresistible Materials Ltd. (United Kingdom)
Guy Dawson, Irresistible Materials Ltd. (United Kingdom)
Greg O'Callaghan, Irresistible Materials Ltd. (United Kingdom)
Carmen Popescu, Irresistible Materials Ltd. (United Kingdom)
Alexandra McClelland, Irresistible Materials Ltd. (United Kingdom)
Tom Lada, Nano-C, Inc. (United States)
Bryan Schofield, Nano-C, Inc. (United States)
Warren Montgomery, Irresistible Materials Ltd. (United Kingdom)
Alex P. G. Robinson, Irresistible Materials Ltd. (United Kingdom)
Univ. of Birmingham (United Kingdom)

Published in SPIE Proceedings Vol. 11326:
Advances in Patterning Materials and Processes XXXVII
Roel Gronheid; Daniel P. Sanders, Editor(s)

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