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Proceedings Paper

Fast algorithm of the scanning lithographic metrics based on a quadratic imaging model and an integral transfer function
Author(s): Zhiyong Yang; Xiuguo Chen; Yating Shi; Hao Jiang; Shiyuan Liu
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Paper Abstract

The impacts of aberrations to lithographic metrics, such as defocus, pattern shift and NILS loss, needs to be calculated quickly in numerous applications of the lithography. This paper presents a fast algorithm for calculating these typical lithographic metrics of scanner. Based on the principal component analysis (PCA) of the aberrated lithographic image, the quadratic regression relationship between the principal component (PC) coefficients and Zernike coefficients is established. The quadratic imaging model (QIM) and the gradient information of all PCs are used to calculate the lithographic metrics. Meanwhile, in order to characterize the impacts of spatial varying aberrations on scanning image and the corresponding lithographic metrics, the integral transfer function is used to calculate the PC coefficients of the aberrated scanning image.

Paper Details

Date Published: 23 March 2020
PDF: 10 pages
Proc. SPIE 11327, Optical Microlithography XXXIII, 1132719 (23 March 2020);
Show Author Affiliations
Zhiyong Yang, Huazhong Univ. of Science and Technology (China)
Xiuguo Chen, Huazhong Univ. of Science and Technology (China)
Yating Shi, Huazhong Univ. of Science and Technology (China)
Hao Jiang, Huazhong Univ. of Science and Technology (China)
Shiyuan Liu, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 11327:
Optical Microlithography XXXIII
Soichi Owa, Editor(s)

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