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Proceedings Paper

Probing buried structures in Inorganic-organic hybrid resists with energy-tunable X-rays (Conference Presentation)
Author(s): Isvar A. Cordova; Luke Long; Guillaume Freychet; Cheng Wang; P. Naulleau

Paper Abstract

With the adoption of extreme ultraviolet (EUV) lithography across the semiconductor industry, there comes a need to develop new resist materials that will become the mainstay enabling technology. This development places pressure on the metrology community to develop adequate non-destructive techniques capable of measuring the sub-10 nm patterns that such resists are meant to produce. Recent progress in grazing incidence and resonant x-ray scattering techniques [1-3] have shown particular promise at being able to address part of these characterization challenges. In this paper, we highlight the potential for various techniques which use energy-tunable x-rays to probe buried structures critical to progress in EUVL. We show how resonant contrast can harness spatially distributed chemical heterogeneities within a resist in order to probe buried structures in a variety of photoresists containing key inorganic components. Specifically, by focusing on inorganic/organic hybrid resists, we demonstrate the potential insights from and correlation between contrast acquired at different elemental absorption edges and chemistries from a given resist.

Paper Details

Date Published: 24 March 2020
PDF
Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113231P (24 March 2020); doi: 10.1117/12.2552178
Show Author Affiliations
Isvar A. Cordova, The Ctr. for X-Ray Optics (United States)
Luke Long, Univ. of California, Berkeley (United States)
Guillaume Freychet, Brookhaven National Lab. (United States)
Cheng Wang, Lawrence Berkeley National Lab. (United States)
P. Naulleau, Univ. of California, Berkeley (United States)


Published in SPIE Proceedings Vol. 11323:
Extreme Ultraviolet (EUV) Lithography XI
Nelson M. Felix; Anna Lio, Editor(s)

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