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Proceedings Paper

EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity, and stochastic defectivity
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Paper Abstract

Flood Exposure Assisted Chemical Gradient Enhancement Technology (FACET) is introduced for improvement in EUV resist resolution, process control, roughness, patterning failure and sensitivity. Experimental EUV exposure latitude was enhanced (~1.5 times) with FACET using the assist of UV flood exposure. The mechanism of the process window improvement by FACET is explained by non-linear resist coloring (enhancement of UV absorption) vs. EUV exposure dose to enhance acid image contrast during UV flood exposure. To balance chemical gradient enhancement and stochastic effects, Stochastic Aware Resist Formulation and Process optimizer (SARF-Pro) with a fast stochastic simulation model is created. SARF-Pro predicts stochastic patterning failure risks, and optimizes resist formulation and processes by putting emphasis on stochastic variation across patterns. Photosensitized Chemically Amplified ResistTM (PSCARTM) 2.0 with FACET and standard chemically amplified resist (CAR) optimized in SARF-Pro suggests that PSCAR 2.0 with FACET has the potential of better process window, roughness, sensitivity and, we hypothesize, reduced risk of stochastic defects compared with standard CAR.

Paper Details

Date Published: 30 March 2020
PDF: 15 pages
Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 113260A (30 March 2020);
Show Author Affiliations
Seiji Nagahara, Tokyo Electron Ltd. (Japan)
Cong Que Dinh, Tokyo Electron Kyushu Ltd. (Japan)
Keisuke Yoshida, Tokyo Electron Kyudhu Ltd. (Belgium)
Gosuke Shiraishi, Tokyo Electron Kyushu Ltd. (Japan)
Yoshihiro Kondo, Tokyo Electron Kyushu Ltd. (Japan)
Kosuke Yoshihara, Tokyo Electron Kyushu Ltd. (Japan)
Kathleen Nafus, Tokyo Electron America, Inc. (Belgium)
John S. Petersen, imec (Belgium)
Danilo De Simone, imec (Belgium)
Philippe Foubert, imec (Belgium)
Geert Vandenberghe, imec (Belgium)
Hans-Jürgen Stock, Synopsys GmbH (Germany)
Balint Meliorisz, Synopsys GmbH (Germany)


Published in SPIE Proceedings Vol. 11326:
Advances in Patterning Materials and Processes XXXVII
Roel Gronheid; Daniel P. Sanders, Editor(s)

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