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Proceedings Paper

How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive
Author(s): Chris Anderson; Arnaud Allezy; Weilun Chao; Lucas Conley; Carl Cork; Will Cork; Rene Delano; Jason DePonte; Michael Dickinson; Geoff Gaines; Jeff Gamsby; Eric Gullikson; Gideon Jones; Lauren McQuade; Ryan Miyakawa; Patrick Naulleau; Seno Rekawa; Farhad Salmassi; Brandon Vollmer; Daniel Zehm; Wenhua Zhu
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Paper Abstract

Vibration levels in MET5 exposures were reduced from 1.5 nm RMS to 0.8 nm RMS by tuning the vibration isolation system and removing non-compliant hardware. Frequency doubling exposures were improved by replacing the Fourier synthesis pupil scanner mirror. Focus-exposure-matrix outliers have been solved by patching a bug in the control software. 9 nm half-pitch lines and 8 nm half-pitch lines were printed in 11 nm thick MOx resist.

Paper Details

Date Published: 23 March 2020
PDF: 8 pages
Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113230B (23 March 2020); doi: 10.1117/12.2552125
Show Author Affiliations
Chris Anderson, Lawrence Berkeley National Lab. (United States)
Arnaud Allezy, Lawrence Berkeley National Lab. (United States)
Weilun Chao, Lawrence Berkeley National Lab. (United States)
Lucas Conley, Inpria Corp. (United States)
Carl Cork, Lawrence Berkeley National Lab. (United States)
Will Cork, Lawrence Berkeley National Lab. (United States)
Rene Delano, Lawrence Berkeley National Lab. (United States)
Jason DePonte, Lawrence Berkeley National Lab. (United States)
Michael Dickinson, Lawrence Berkeley National Lab. (United States)
Geoff Gaines, Lawrence Berkeley National Lab. (United States)
Jeff Gamsby, Lawrence Berkeley National Lab. (United States)
Eric Gullikson, Lawrence Berkeley National Lab. (United States)
Gideon Jones, Lawrence Berkeley National Lab. (United States)
Lauren McQuade, Inpria Corp. (United States)
Ryan Miyakawa, Lawrence Berkeley National Lab. (United States)
Patrick Naulleau, Lawrence Berkeley National Lab. (United States)
Seno Rekawa, Lawrence Berkeley National Lab. (United States)
Farhad Salmassi, Lawrence Berkeley National Lab. (United States)
Brandon Vollmer, Lawrence Berkeley National Lab. (United States)
Daniel Zehm, Lawrence Berkeley National Lab. (United States)
Wenhua Zhu, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 11323:
Extreme Ultraviolet (EUV) Lithography XI
Nelson M. Felix; Anna Lio, Editor(s)

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