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Proceedings Paper

Integrating enhanced hotspot library into manufacturing OPC correction flow
Author(s): Bradley J. Falch; Linghui Wu; John Tsai; Elsley Tan; Jiunhau Fu; Tengyen Huang; Chuncheng Liao
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Paper Abstract

As feature sizes diminish and correction flow complexity increases, it becomes extremely difficult to create homogeneous mask synthesis correction recipes that can pass lithographic verification without some failing hotspots. When encountered in the production line, these areas are frequently fixed quickly so the tapeout can resume and time-tomask is preserved as much as possible. However, these hotspots may occur in future designs, so it is beneficial to update the standard correction recipe with this hotspot information and avoid verification failures before they occur. This paper examines inserting unique hotspot corrections into the standard correction flow using pattern matching to identify the hotspot areas. Standard correction recipes can be updated to accept these hotspot areas and adjust recipe parameters or correction techniques in a standard manner so that these hotspots will be fixed automatically. This automation technique minimizes human interaction with the recipe.

Paper Details

Date Published: 23 March 2020
PDF: 11 pages
Proc. SPIE 11328, Design-Process-Technology Co-optimization for Manufacturability XIV, 113280E (23 March 2020); doi: 10.1117/12.2552110
Show Author Affiliations
Bradley J. Falch, Synopsys, Inc. (United States)
Linghui Wu, Synopsys, Inc. (United States)
John Tsai, Synopsys, Inc. (Taiwan)
Elsley Tan, Synopsys, Inc. (Taiwan)
Jiunhau Fu, Nanya Technology Corp. (Taiwan)
Tengyen Huang, Nanya Technology Corp. (Taiwan)
Chuncheng Liao, Nanya Technology Corp. (Taiwan)


Published in SPIE Proceedings Vol. 11328:
Design-Process-Technology Co-optimization for Manufacturability XIV
Chi-Min Yuan, Editor(s)

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