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Proceedings Paper

A novel projection lens manipulator for high frequent overlay tuning
Author(s): Thilo Pollak; Wolfgang Emer; Bernd Thüring; Francis Fahrni; Friso Klinkhamer; Wim de Boeij; Wim Bouman
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Paper Abstract

Even with the large-scale adaption of EUV Lithography to High Volume Manufacturing, numerous device-critical product layers will still be exposed with Immersion Lithography Technology and therefore ZEISS and ASML keep investing in the next generation immersion extensions. The overlay accuracy has to be controlled over the exposure field more accurately and also on a higher spatial frequency grid. To support this functionality, a novel manipulator will be incorporated into the next generation of immersion optics, which is especially well-suited for high frequent distortion tuning. Furthermore, lens distortion measurements and adjustments will be done based on more field points. In this paper, we will show the unique correction functionality of this manipulator and show its various application fields for improving the performance of ASML scanners.

Paper Details

Date Published: 23 March 2020
PDF: 6 pages
Proc. SPIE 11327, Optical Microlithography XXXIII, 113270T (23 March 2020);
Show Author Affiliations
Thilo Pollak, Carl Zeiss SMT GmbH (Germany)
Wolfgang Emer, Carl Zeiss SMT GmbH (Germany)
Bernd Thüring, Carl Zeiss SMT GmbH (Germany)
Francis Fahrni, ASML Netherlands B.V. (Netherlands)
Friso Klinkhamer, ASML Netherlands B.V. (Netherlands)
Wim de Boeij, ASML Netherlands B.V. (Netherlands)
Wim Bouman, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 11327:
Optical Microlithography XXXIII
Soichi Owa, Editor(s)

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