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Proceedings Paper

Sensitivity analysis for the detection of pitchwalk in self-aligned quadruple patterning by GISAXS
Author(s): Maren Casfor Zapata; Nando Farchmin; Mika Pflüger; Konstantin Nikolaev; Victor Soltwisch; Sebastian Heidenreich; Christian Laubis; Michael Kolbe; Frank Scholze
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Paper Abstract

Recent studies for profile reconstructions of nanostructures produced with self-aligned quadruple patterning (SAQP) indicate the limits for solving the inverse problem with a rigorous simulation. Using Monte Carlo methods for the theoretical investigation of the observed pitchwalk behaviour is not feasible due to the high computational cost of simulating GISAXS measurements by solving Maxwell’s equations with an FEM approach for each proposed structural model. We will show that a surrogate model based on a polynomial chaos expansion is a versatile tool to reduce the computational effort significantly. The expansion provides not only a surrogate for the forward model, but also Sobol indices for a global sensitivity analysis. This enables the study of the sensitivities in GISAXS in detail.

Paper Details

Date Published: 20 March 2020
PDF: 9 pages
Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 113251D (20 March 2020); doi: 10.1117/12.2552037
Show Author Affiliations
Maren Casfor Zapata, Physikalisch-Technische Bundesanstalt (Germany)
Nando Farchmin, Physikalisch-Technische Bundesanstalt (Germany)
Mika Pflüger, Physikalisch-Technische Bundesanstalt (Germany)
Konstantin Nikolaev, Physikalisch-Technische Bundesanstalt (Germany)
Victor Soltwisch, Physikalisch-Technische Bundesanstalt (Germany)
Sebastian Heidenreich, Physikalisch-Technische Bundesanstalt (Germany)
Christian Laubis, Physikalisch-Technische Bundesanstalt (Germany)
Michael Kolbe, Physikalisch-Technische Bundesanstalt (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)


Published in SPIE Proceedings Vol. 11325:
Metrology, Inspection, and Process Control for Microlithography XXXIV
Ofer Adan; John C. Robinson, Editor(s)

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