Proceedings Paper
Illumination control in lensless imaging for EUV mask inspection and review| Format | Member Price | Non-Member Price |
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Paper Abstract
Coherence control and flexible pupil fill play a key role in the imaging of EUV reticles. This is also true for lensless metrology applications based on coherent diffraction imaging. We describe the concept and the key components of a Fourier synthesis illuminator designed to provide the RESCAN microscope with flexible illumination capabilities and to improve its resolution limit. In particular, we discuss the characteristics of the three mirrors of the new illuminator and the requirements for their multilayer coating.
Paper Details
Date Published: 23 March 2020
PDF: 9 pages
Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113231I (23 March 2020); doi: 10.1117/12.2552014
Published in SPIE Proceedings Vol. 11323:
Extreme Ultraviolet (EUV) Lithography XI
Nelson M. Felix; Anna Lio, Editor(s)
PDF: 9 pages
Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113231I (23 March 2020); doi: 10.1117/12.2552014
Show Author Affiliations
Iacopo Mochi, Paul Scherrer Institut (Switzerland)
Hyun-Su Kim, Paul Scherrer Institut (Switzerland)
Uldis Locans, Paul Scherrer Institut (Switzerland)
Atoosa Dejkameh, Paul Scherrer Institut (Switzerland)
Hyun-Su Kim, Paul Scherrer Institut (Switzerland)
Uldis Locans, Paul Scherrer Institut (Switzerland)
Atoosa Dejkameh, Paul Scherrer Institut (Switzerland)
Ricarda Nebling, Paul Scherrer Institut (Switzerland)
Dimitrios Kazazis, Paul Scherrer Institut (Switzerland)
Yasin Ekinici, Paul Scherrer Institut (Switzerland)
Dimitrios Kazazis, Paul Scherrer Institut (Switzerland)
Yasin Ekinici, Paul Scherrer Institut (Switzerland)
Published in SPIE Proceedings Vol. 11323:
Extreme Ultraviolet (EUV) Lithography XI
Nelson M. Felix; Anna Lio, Editor(s)
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