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Proceedings Paper

Multicolumn e-beam lithography (MEBL) for IC traceability: MEBL enables chip ID to thwart tampering/counterfeiting
Author(s): David K. Lam
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Paper Abstract

Multicolumn Electron Beam Lithography (MEBL), a proprietary technology platform developed by Multibeam Corporation, is being applied to enable Security Lithography – a maskless embedding of unique security information into each IC during routine wafer fabrication. This paper focuses on ensuring Secure Chip ID, which provides traceability of a chip throughout its lifecycle and enables confirmation of its unique identity and provenance. The complete MEBL embedding process is disclosed – from chip design to IC fab to verification test. This paper also shows how MEBL hardcoding of the Secure Chip ID “at the silicon level” makes the embedding process cost-efficient and tamperproof.

Paper Details

Date Published: 31 March 2020
PDF: 7 pages
Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113240P (31 March 2020);
Show Author Affiliations
David K. Lam, Multibeam Corp. (United States)


Published in SPIE Proceedings Vol. 11324:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
Martha I. Sanchez; Eric M. Panning, Editor(s)

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