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Proceedings Paper

Rigorous vase data fitting for ultrathin films
Author(s): Zhimin Zhu Sr.; Joyce Lowes; Shawn Ye; Zhiqiang Fan; Darin Collins; James Lamb; Tim Limmer
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Paper Abstract

Measuring properties of ultrathin optical films is based on optical interference. Ultrathin films are very challenging to test, because their thicknesses are far smaller than the measuring wavelength, so very little phase shift can be detected. In this work, test sensitivity and accuracy are improved by a rigorous algorithm in which all unknowns {n,k,t} in their full space are fit together without approximations and presumptions. As a result, a software for variable-angle spectroscopic ellipsometer (VASE) data fitting was developed. It gives very reliable ultrathin-film measurement down to 2.5 nanometers. The software not only improves the reliability, accuracy of {n,k,t} measurement, but it also extends VASE capabilities to characterize a film’s optical quality.

Paper Details

Date Published: 23 March 2020
PDF: 6 pages
Proc. SPIE 11327, Optical Microlithography XXXIII, 113270J (23 March 2020);
Show Author Affiliations
Zhimin Zhu Sr., Brewer Science, Inc. (United States)
Joyce Lowes, Brewer Science, Inc. (United States)
Shawn Ye, Brewer Science, Inc. (United States)
Zhiqiang Fan, Brewer Science, Inc. (United States)
Darin Collins, Brewer Science, Inc. (United States)
James Lamb, Brewer Science, Inc. (United States)
Tim Limmer, Brewer Science, Inc. (United States)

Published in SPIE Proceedings Vol. 11327:
Optical Microlithography XXXIII
Soichi Owa, Editor(s)

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