Share Email Print

Proceedings Paper

Approaches for full coverage physical design space exploration and analysis by synthetic layout generation
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

At the core of Design-technology co-optimization (DTCO) processes, is the Design Space Exploration (DSE), where different design schemes and patterns are systematically analyzed and design rules and processes are co-optimized for optimal yield and performance before real products are designed. Synthetic layout generation offers a solution. With rules-based synthetic layout generation, engineers design rules to generate realistic layout they will later see in real product designs. This paper shows two approaches to generating full coverage of the design space and providing contextual layout. One approach relies on Monte Carlo methods and the other depends on combining systematic and random methods to core patterns and their contextual layout. Also, in this paper we present a hierarchical classification system that catalogs layouts based on pattern commonality. The hierarchical classification is based on a novel algorithm of creating a genealogical tree of all the patterns in the design space.

Paper Details

Date Published: 23 March 2020
PDF: 10 pages
Proc. SPIE 11328, Design-Process-Technology Co-optimization for Manufacturability XIV, 1132808 (23 March 2020); doi: 10.1117/12.2551916
Show Author Affiliations
Marwah Shafee, Mentor Graphics Egypt (Egypt)
Joe Kwan, Mentor, a Siemens Business (United States)
Wael El-Manhawy, Mentor, a Siemens Business (United States)
Aliaa Kabeel, Mentor Graphics Egypt (Egypt)
Sarah Risk, Mentor Graphics Egypt (Egypt)
Jongha Park, Mentor Graphics Korea Co. Inc. (Korea, Republic of)
SeungJo Lee, Mentor Graphics Korea Co. Inc. (Korea, Republic of)
Jin Hee Kim, Mentor Graphics Korea Co. Inc. (Korea, Republic of)
Mostafa Alaa, Mentor Graphics Egypt (Egypt)
Mohamed Bahnasawi, Mentor Graphics Egypt (Egypt)
Abdelrahman Abdelrazek, Nabla Advanced Systems (Egypt)
Sherif Hammouda, Mentor Graphics Egypt (Egypt)
Kareem Madkour, Mentor Graphics Egypt (Egypt)
Nabil Sabry, Mansoura Univ. (Egypt)
Nabla Advanced Systems (Egypt)

Published in SPIE Proceedings Vol. 11328:
Design-Process-Technology Co-optimization for Manufacturability XIV
Chi-Min Yuan, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?