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Proceedings Paper

Precision manufacture of aspheric optics by robot-based bonnet polishing
Author(s): Bo Zhong; Wen-hui Deng; Xian-hua Chen; Nan Zheng
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Paper Abstract

The high-precision aspheric optics is difficult to achieve batch production because of its high complexity and cost in manufacturing process. Bonnet polishing is an efficient and precision polishing technology that has been widely used in aspheric optics manufacturing process. The existing aspheric bonnet polishing is mostly based on the five-axis CNC machine, but its cost is high. With the development of robot technology, it is a new, economical and effective attempt to combine robotic technology with bonnet polishing technology and apply it to manufacture the precision aspheric optics. In this paper, the research on robot-based bonnet polishing technology of aspheric optics is carried out. Firstly, the robotbased bonnet polishing equipment is introduced. Then, the control model of the robot-based bonnet polishing technology of aspheric optics is established. Finally, the aspheric polishing verification experiments are completed, and the good results are obtained. In this paper, the high-efficiency and high-precision manufacture of aspheric optics by robot-based bonnet polishing technology is realized, which greatly reduces the cost of aspheric precision manufacturing equipment, and provides a new technology choice for the high-precision, low-cost and batch production of aspheric optics.

Paper Details

Date Published: 31 January 2020
PDF: 7 pages
Proc. SPIE 11427, Second Target Recognition and Artificial Intelligence Summit Forum, 114271Q (31 January 2020); doi: 10.1117/12.2551855
Show Author Affiliations
Bo Zhong, China Academy of Engineering Physics (China)
Wen-hui Deng, China Academy of Engineering Physics (China)
Xian-hua Chen, China Academy of Engineering Physics (China)
Nan Zheng, China Academy of Engineering Physics (China)


Published in SPIE Proceedings Vol. 11427:
Second Target Recognition and Artificial Intelligence Summit Forum
Tianran Wang; Tianyou Chai; Huitao Fan; Qifeng Yu, Editor(s)

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