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Proceedings Paper

Quantum Inspire: QuTech’s platform for co-development and collaboration in quantum computing
Author(s): Thorsten Last; Nodar Samkharadze; Pieter Eendebak; Richard Versluis; Xiao Xue; Amir Sammak; Delphine Brousse; Kelvin Loh; Henk Polinder; Giordano Scappucci; Menno Veldhorst; Lieven Vandersypen; Klará Maturová; Jeremy Veltin; Garrelt Alberts
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Paper Abstract

The mission of QuTech is to bring quantum technology to industry and society by translating fundamental scientific research into applied research. To this end we are developing Quantum Inspire (QI), a full-stack quantum computer prototype for future co-development and collaborative R&D in quantum computing. A prerelease of this prototype system is already offering the public cloud-based access to QuTech technologies such as a programmable quantum computer simulator (with up to 31 qubits) and tutorials and user background knowledge on quantum information science (www.quantum-inspire.com). Access to a programmable CMOS-compatible Silicon spin qubit-based quantum processor will be provided in the next deployment phase. The first generation of QI’s quantum processors consists of a double quantum dot hosted in an in-house grown SiGe/28Si/SiGe heterostructure, and defined with a single layer of Al gates. Here we give an overview of important aspects of the QI full-stack. We illustrate QI’s modular system architecture and we will touch on parts of the manufacturing and electrical characterization of its first generation two spin qubit quantum processor unit. We close with a section on QI’s qubit calibration framework. The definition of a single qubit Pauli X gate is chosen as concrete example of the matching of an experiment to a component of the circuit model for quantum computation.

Paper Details

Date Published: 23 March 2020
PDF: 11 pages
Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113240J (23 March 2020);
Show Author Affiliations
Thorsten Last, QuTech Advanced Research Ctr. (Netherlands)
TNO (Netherlands)
Nodar Samkharadze, QuTech Advanced Research Ctr. (Netherlands)
TNO (Netherlands)
Pieter Eendebak, QuTech Advanced Research Ctr. (Netherlands)
TNO (Netherlands)
Richard Versluis, QuTech Advanced Research Ctr. (Netherlands)
TNO (Netherlands)
Xiao Xue, QuTech Advanced Research Ctr. (Netherlands)
Kavli Institute of Nanoscience Delft (Netherlands)
Amir Sammak, QuTech Advanced Research Ctr. (Netherlands)
TNO (Netherlands)
Delphine Brousse, QuTech Advanced Research Ctr. (Netherlands)
TNO (Netherlands)
Kelvin Loh, TNO (Netherlands)
Henk Polinder, TNO (Netherlands)
Giordano Scappucci, QuTech Advanced Research Ctr. (Netherlands)
Kavli Institute of Nanoscience Delft (Netherlands)
Menno Veldhorst, QuTech Advanced Research Ctr. (Netherlands)
Kavli Institute of Nanoscience Delft (Netherlands)
Lieven Vandersypen, QuTech Advanced Research Ctr. (Netherlands)
Kavli Institute of Nanoscience Delft (Netherlands)
Klará Maturová, QuTech Advanced Research Ctr. (Netherlands)
TNO (Netherlands)
Jeremy Veltin, TNO (Netherlands)
Garrelt Alberts, QuTech Advanced Research Ctr. (Netherlands)
TNO (Netherlands)


Published in SPIE Proceedings Vol. 11324:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
Martha I. Sanchez; Eric M. Panning, Editor(s)

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