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Proceedings Paper

Statistical local CD uniformity with novel SEM noise reduction method
Author(s): Shinji Kobayashi
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Paper Abstract

This paper reports line width roughness (LWR) measurement with edge averaging method (EAM) for different measurement length (L). The issues of LWR measurement are that raw LWR measurement data contains non-negligible image noise components and depends on L. EAM is an analysis method that creates several artificial images from 4D information (x axis, y axis, pixel color and frames) of scanning electron microscopy (SEM) and detects pattern’s edges. EAM is needed only 4 one-frame’s images. Power spectral density (PSD), auto-correlation function (ACF) and height-height correlation function (HHCF) using EAM edge data were studied. As the second topic, the relationship among CD variation, LWR and PSD curves are described. The balance of CD variation and LWR depends on L. For example, when L is shortened, LWR at low frequency component changes to CD variation. To clarify L is important to compare various LWR measurement results. Therefore, we propose “𝐿𝑊𝑅xr ” (x is “Biased”, “Unbiased” or “Noise”) to express LWR.

Paper Details

Date Published: 20 March 2020
PDF: 8 pages
Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 1132520 (20 March 2020); doi: 10.1117/12.2551821
Show Author Affiliations
Shinji Kobayashi, Tokyo Electron Kyushu Ltd. (Japan)


Published in SPIE Proceedings Vol. 11325:
Metrology, Inspection, and Process Control for Microlithography XXXIV
Ofer Adan; John C. Robinson, Editor(s)

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