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Proceedings Paper

Line width roughness reduction strategies utilizing power spectral density analysis (Conference Presentation)
Author(s): Charlotte A. Cutler; Dan Millward; Choong-Bong Lee; James W. Thackeray; John Nelson; Jason DeSisto; Rochelle Rena; Chris Mack

Paper Abstract

Linewidth Roughness (LWR) remains a difficult challenge in resist materials. In previous work we focused on showing how roughness Power Spectral Density (PSD) parameters were affected by aerial image and basic resist parameters such as diffusion. This highlighted the relationship between PSD(0) and correlation length in optimizing LWR. By measuring the unbiased PSDs with MetroLER we showed LWR measurements could be expressed as a ratio between the roughness PSD parameters. In this paper we show how LWR improvement can be achieved by several strategies that focus on both PSD(0) and correlation length and not a single LWR number.

Paper Details

Date Published: 24 March 2020
Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 113260H (24 March 2020);
Show Author Affiliations
Charlotte A. Cutler, DuPont Electronics & Imaging (United States)
Dan Millward, DuPont Electronics & Imaging (United States)
Choong-Bong Lee, DuPont Electronics & Imaging (United States)
James W. Thackeray, DuPont Electronics & Imaging (United States)
John Nelson, DuPont Electronics & Imaging (United States)
Jason DeSisto, DuPont Electronics & Imaging (United States)
Rochelle Rena, DuPont Electronics & Imaging (United States)
Chris Mack, Fractilia, LLC (United States)

Published in SPIE Proceedings Vol. 11326:
Advances in Patterning Materials and Processes XXXVII
Roel Gronheid; Daniel P. Sanders, Editor(s)

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