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Proceedings Paper

Explore process weak patterns for manufacturing friendly design
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Paper Abstract

Silicon weak pattern exploration becomes more and more attractive for yield improvement and design robustness as these proven silicon weak patterns or hotspots directly reveals process weakness and should be avoided to occur on the chip design. At the very beginning, only a few known hotspot patterns are available as seeds to initialize the weak pattern accumulation process. Machine learning technique can be utilized to expand the weak pattern database, the data volume is critical for machine learning. Fuzzy patterns are built and more potential hotspots locations are found and sent to YE team to confirm, thus more silicon proven data is available for machine learning model training, both good patterns and bad patterns are valuable for the training data set. The trained machine learning model is then used for new hotspots prediction. The outcome from the machine learning prediction need to be validated by silicon data in the first few iterations. When a reliable machine learning model is ready for hotspots detection, designers can run hotspot prediction at the design stage. There are some techniques in training the mode and will be discussed in details in the paper.

Paper Details

Date Published: 23 March 2020
PDF: 6 pages
Proc. SPIE 11328, Design-Process-Technology Co-optimization for Manufacturability XIV, 1132812 (23 March 2020); doi: 10.1117/12.2551691
Show Author Affiliations
Jet Jiang, Yangtze Memory Technologies Co., Ltd. (China)
Frank Hou, Yangtze Memory Technologies Co., Ltd. (China)
Gavin Li, Yangtze Memory Technologies Co., Ltd. (China)
Marfe Ma, Yangtze Memory Technologies Co., Ltd. (China)
Kuan Hu, Yangtze Memory Technologies Co., Ltd. (China)
Chunshan Du, Mentor Graphics (Shanghai) Electronics Technology Co., Ltd. (China)
Qijian Wan, Mentor Graphics (Shanghai) Electronics Technology Co., Ltd. (China)
Zhengfang Liu, Mentor Graphics (Shanghai) Electronics Technology Co., Ltd. (China)
Xinyi Hu, Mentor Graphics (Shanghai) Electronics Technology Co., Ltd. (China)
Elven Huang, Mentor Graphics Corp. (United States)
Wael ElManhawy, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 11328:
Design-Process-Technology Co-optimization for Manufacturability XIV
Chi-Min Yuan, Editor(s)

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