Share Email Print

Proceedings Paper

Improvement of EUV Si hardmask performance through wet chemistry functionalization
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In EUV lithography, spin-on silicon hardmasks have been widely used not only as etch transfer layers, but also as assist layers to enhance the lithographic performance of resist. In this study, we demonstrate a novel approach to functionalize spin-on silicon hardmasks by hybridizing them with functional groups through a sol-gel approach. By varying the concentration and type of the functional groups, the structure and property of the hardmasks can be tuned effectively, especially in the aspects of surface energy, elemental composition, and hardness. The lithographic performance of the functionalized hardmasks was evaluated using NXE3300 EUV exposure system to print line-space features with a targeted CD = 16 nm half pitch. Evidenced by the results, when the functionalized hardmasks were used as underlayers, the resist exhibits large processing window with the printable CD ranging from 11.9 to 19.7 nm and a biased 3-sigma line width roughness = 3.73 nm. In contrast, on a non-functionalized spin-on hardmask, no feature can be printed. Finally, the CF4 and O2 plasma etch rates of the hardmasks were tested to evaluate the impact of functionalization on their etch-selectivity.

Paper Details

Date Published: 23 March 2020
PDF: 9 pages
Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 1132614 (23 March 2020); doi: 10.1117/12.2551671
Show Author Affiliations
Yichen Liang, Brewer Science, Inc. (United States)
Andrea M. Chacko, Brewer Science, Inc. (United States)
Samantha Oelklaus, Brewer Science, Inc. (United States)
Ethan Lowrey, Brewer Science, Inc. (United States)
Veerle Van Driessche, Brewer Science, Inc. (United States)
Ivan R. Sedlacek, Brewer Science, Inc. (United States)
Ming Luo, Brewer Science, Inc. (United States)
Stephen M. Grannemann, Brewer Science, Inc. (United States)
Douglas J. Guerrero, Brewer Science, Inc. (United States)

Published in SPIE Proceedings Vol. 11326:
Advances in Patterning Materials and Processes XXXVII
Roel Gronheid; Daniel P. Sanders, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?