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Proceedings Paper

Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
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Paper Abstract

The effective dose delivered by an EUV lithography cluster is composite function of the dose provided by the scanner EUV radiation source and illuminator, the reflectance of the EUV mask, the transmission of the scanner projection optics and the PEB conditions experienced by the EUV sensitive imaging resist. Open frame test wafer exposures and the sub-E0 analysis technique described at SPIE2018 have been adopted to characterize and monitor the impact of the factors above on the effective dose stability and uniformity. Wafer exposure sequences and layouts, and the details of the analysis methodology were customized to study adverse dose factors in each of the areas described above.

Paper Details

Date Published: 23 March 2020
PDF: 10 pages
Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113230P (23 March 2020);
Show Author Affiliations
Chris Robinson, IBM Corp. (United States)
Cody Murray, IBM Corp. (United States)
Luciana Meli, IBM Corp. (United States)
Anuja De Silva, IBM Corp. (United States)
Dario Goldfarb, IBM Corp. (United States)
Conor Thomas, IBM Corp. (United States)
Madhana Sunder, IBM Corp. (United States)
Mary Ann Zaitz, IBM Corp. (United States)
Guoda Lian, IBM Corp. (United States)
Yiping Yao, IBM Corp. (United States)
Leo Tai, IBM Corp. (United States)
Jay Bunt, IBM Corp. (United States)
Jim Rosa, IBM Corp. (United States)
Malik Ali, IBM Corp. (United States)
Steven Boettcher, IBM Corp. (United States)
Mark Stalter, IBM Corp. (United States)


Published in SPIE Proceedings Vol. 11323:
Extreme Ultraviolet (EUV) Lithography XI
Nelson M. Felix; Anna Lio, Editor(s)

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