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Proceedings Paper

Experimental investigation of high power inductively coupled plasma etching of fused silica at atmospheric pressure
Author(s): Xiao-qiang Zhang; Yuan-cheng Sun; Xiu-rong Du; Xue-fu Song
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Paper Abstract

To inspect the treatment effect of high power plasma on fused silica, inductively coupled plasma with power of 36kW at atmospheric pressure , CF4 as working gas, was applied to carry out the etching experiments of fused silica, in which the effect of CF4 flow rate on material remove rate, surface roughness and surface profile were investigated. The experimental results showed that the material remove mechanism of fused silica treated by high power inductively coupled plasma was a result of the comprehensive effect of melting and evaporation at high temperature, chemical etching and bombardment of high energy ions. The fused silica remove rate reached 0.208g/min with the CF4 flow rate of 2.8L/min. The surfaces of fused silica samples became rougher with the increased CF4 flow rate, as the subsurface micro-cracks were opened and formed etching pits by the plasma etching. The surface global profile was affected seriously by the distance between outer plasma flame and samples while the local profile was dominated by etching pits.

Paper Details

Date Published: 31 January 2020
PDF: 8 pages
Proc. SPIE 11427, Second Target Recognition and Artificial Intelligence Summit Forum, 114271I (31 January 2020); doi: 10.1117/12.2551583
Show Author Affiliations
Xiao-qiang Zhang, China Building Materials Academy (China)
Yuan-cheng Sun, China Building Materials Academy (China)
Xiu-rong Du, China Building Materials Academy (China)
Xue-fu Song, China Building Materials Academy (China)


Published in SPIE Proceedings Vol. 11427:
Second Target Recognition and Artificial Intelligence Summit Forum
Tianran Wang; Tianyou Chai; Huitao Fan; Qifeng Yu, Editor(s)

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