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Proceedings Paper

Tip- and laser-based nanofabrication up to 100 mm with sub-nanometre precision
Author(s): Ingo Ortlepp; Michael Kühnel; Martin Hofmann; Laura Weidenfeller; Johannes Kirchner; Shraddha Supreeti; Rostyslav Mastylo; Mathias Holz; Thomas Michels; Roland Füßl; Ivo W. Rangelow; Thomas Fröhlich; Denis Dontsov; Christoph Schäffel; Eberhard Manske
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Paper Abstract

Although the field of optical lithography is highly investigated and numerous improvements are made, structure sizes smaller than 20 nm can only be achieved by considerable effort when using conventional technology. To cover the upcoming tasks in future lithography, enormous exertion is put into the development of alternative fabrication technologies in particular for micro- and nanotechnologies that are capable of measuring and patterning at the atomic scale in growing operating areas of several hundred square millimetres. Many new technologies resulted in this process, and are promising to overcome the current limitations1, 2, but most of them are demonstrated in small areas of several square micrometers only, using state-of-the-art piezo stages or the like. At the Technische Universitat Ilmenau, the NanoFabrication Machine 100 (NFM-100) was developed, which serves as an important experimental platform for basic research in the field of scale-spanning AFM tip-based and laser-based nanomeasuring and nanofabrication for simultaneous subnanometre measuring and structuring on surfaces up to Ø100 mm. This machine can be equipped with several probing systems like AFM, laser focus probes and 3D-micro probes as well as tools for different nanofabrication technologies like tip-based technologies, optical technologies and mechanical two-dimensional technologies in a large working range with subnanometre reproducibility and uncertainty. In this paper, the specifics and advantages of the NFM-100 will be described as well as nanofabrication technologies that are currently worked on e.g. advanced scanning proximal probe lithography based on Fowler-Nordheim-electron-field emission, direct laser writing and UV-nanoimprint lithography.

Paper Details

Date Published: 23 March 2020
PDF: 17 pages
Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113240A (23 March 2020); doi: 10.1117/12.2551044
Show Author Affiliations
Ingo Ortlepp, Technische Univ. Ilmenau (Germany)
Michael Kühnel, Technische Univ. Ilmenau (Germany)
Martin Hofmann, Technische Univ. Ilmenau (Germany)
Laura Weidenfeller, Technische Univ. Ilmenau (Germany)
Johannes Kirchner, Technische Univ. Ilmenau (Germany)
Shraddha Supreeti, Technische Univ. Ilmenau (Germany)
Rostyslav Mastylo, Technische Univ. Ilmenau (Germany)
Mathias Holz, Technische Univ. Ilmenau (Germany)
Thomas Michels, Technische Univ. Ilmenau (Germany)
Roland Füßl, Technische Univ. Ilmenau (Germany)
Ivo W. Rangelow, Technische Univ. Ilmenau (Germany)
Thomas Fröhlich, Technische Univ. Ilmenau (Germany)
Denis Dontsov, SIOS Meßtechnik GmbH (Germany)
Christoph Schäffel, Institut für Mikroelektronik- und Mechatronik-Systeme (Germany)
Eberhard Manske, Technische Univ. Ilmenau (Germany)

Published in SPIE Proceedings Vol. 11324:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
Martha I. Sanchez; Eric M. Panning, Editor(s)

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