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Proceedings Paper

Spectral purity performance of high-power EUV systems
Author(s): Mark van de Kerkhof; Fei Liu; Marieke Meeuwissen; Xueqing Zhang; Robert de Kruif; Natalia Davydova; Guido Schiffelers; Felix Wählisch; Eelco van Setten; Wouter Varenkamp; Kees Ricken; Laurens de Winter; John McNamara; Muharrem Bayraktar
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Paper Abstract

With the introduction of the NXE:3400B scanner, ASML has brought EUV to High-Volume Manufacturing (HVM). The high EUV power of >200W being realized with this system satisfies the throughput requirements of HVM, but also requires reconsideration of the imaging aspects of spectral purity, both from the details of the EUV emission spectrum and from the DUV emission. This paper will present simulation and experimental results for the spectral purity of high-power EUV systems, and the imaging impact of this, both for the case of with and without a pellicle. Also, possible controls for spectral purity will be discussed, and a novel method will be described to measure imaging impact of varying CE and DUV. It will be shown that CE optimization towards higher source power leads to reduction in relative DUV content, that the small deltas in EUV source spectrum for higher power do not influence imaging. It will also be shown that resulting variations in DUV do not affect imaging performance significantly, provided that a suitable reticle black border is used. In short, spectral purity performance is not a bottleneck for increasing power of EUV systems to well above 250W.

Paper Details

Date Published: 23 March 2020
PDF: 16 pages
Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 1132321 (23 March 2020);
Show Author Affiliations
Mark van de Kerkhof, ASML Netherlands B.V. (Netherlands)
Fei Liu, ASML Netherlands B.V. (Netherlands)
Marieke Meeuwissen, ASML Netherlands B.V. (Netherlands)
Xueqing Zhang, ASML Netherlands B.V. (Netherlands)
Robert de Kruif, ASML Netherlands B.V. (Netherlands)
Natalia Davydova, ASML Netherlands B.V. (Netherlands)
Guido Schiffelers, ASML Netherlands B.V. (Netherlands)
Felix Wählisch, ASML Netherlands B.V. (Netherlands)
Eelco van Setten, ASML Netherlands B.V. (Netherlands)
Wouter Varenkamp, ASML Netherlands B.V. (Netherlands)
Kees Ricken, ASML Netherlands B.V. (Netherlands)
Laurens de Winter, ASML Netherlands B.V. (Netherlands)
John McNamara, ASML Netherlands B.V. (Netherlands)
Muharrem Bayraktar, Univ. of Twente (Netherlands)


Published in SPIE Proceedings Vol. 11323:
Extreme Ultraviolet (EUV) Lithography XI
Nelson M. Felix; Anna Lio, Editor(s)

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