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Proceedings Paper

Dual tone sub-resolution assist features to improve corner rounding
Author(s): Cheng Chi; Hao Tang; Oseo Park; Jing Xue; Jing Guo; Geng Han; Charlie King; Jeff Shearer; Sean Burns
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Paper Abstract

Corner rounding improvement is critical to device performance, yield, and cell area reduction. In this paper, we present a method to use dual tone sub-resolution assist feature (SRAF) to improve both the outer corner rounding and inner corner rounding which in turn enhance the pattern quality. The simulation data and wafer data are presented. A few parameters have been investigated, such as the position of the SRAF, the shape of the SRAF, resist type and mask tone. The preliminary results show that more than 40% reduction of both inner corner rounding and outer corner rounding can be achieved by placing sub-resolution assist features at appropriate locations. The limit of corner rounding improvement is determined by mask rule check (MRC) and resist sensitivities.

Paper Details

Date Published: 17 April 2020
PDF: 6 pages
Proc. SPIE 11327, Optical Microlithography XXXIII, 113270E (17 April 2020); doi: 10.1117/12.2550834
Show Author Affiliations
Cheng Chi, IBM Thomas J. Watson Research Ctr. (United States)
Hao Tang, IBM Thomas J. Watson Research Ctr. (United States)
Oseo Park, IBM Thomas J. Watson Research Ctr. (United States)
Jing Xue, Synopsys, Inc. (United States)
Jing Guo, IBM Thomas J. Watson Research Ctr. (United States)
Geng Han, IBM Thomas J. Watson Research Ctr. (United States)
Charlie King, Synopsys, Inc. (United States)
Jeff Shearer, IBM Thomas J. Watson Research Ctr. (United States)
Sean Burns, IBM Thomas J. Watson Research Ctr. (United States)


Published in SPIE Proceedings Vol. 11327:
Optical Microlithography XXXIII
Soichi Owa, Editor(s)

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