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Proceedings Paper

Pixelated mask optimization on quantum computers
Author(s): Yosuke Okudaira; Satoshi Yashiki
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Paper Abstract

In the field of microlithography, conventional computers are widely used for mask optimization. Recent progress of quantum and quantum-inspired computers has encouraged the development of quantum algorithms for numerous applications. So far, no method has been established for solving mask optimization problems with quantum computers. We introduced a simple model that describes the mask optimization problem as a quadratic unconstrained binary optimization (QUBO) problem, which is easily implemented on these computers. For simplicity, we assume there exists a target image profile on the wafer. The target can be the image of an existing mask or a virtual ideal mask which may be designed as a pixelated mask having a continuous transmission distribution. The solution is evaluated as the difference between the simulated image profile on the wafer surface and the target profile.

Paper Details

Date Published: 23 March 2020
PDF: 11 pages
Proc. SPIE 11327, Optical Microlithography XXXIII, 1132705 (23 March 2020); doi: 10.1117/12.2550780
Show Author Affiliations
Yosuke Okudaira, Nikon Corp. (Japan)
Satoshi Yashiki, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 11327:
Optical Microlithography XXXIII
Soichi Owa, Editor(s)

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