Share Email Print
cover

Proceedings Paper

Pixelated mask optimization on quantum computers
Author(s): Yosuke Okudaira; Satoshi Yashiki
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In the field of microlithography, conventional computers are widely used for mask optimization. Recent progress of quantum and quantum-inspired computers has encouraged the development of quantum algorithms for numerous applications. So far, no method has been established for solving mask optimization problems with quantum computers. We introduced a simple model that describes the mask optimization problem as a quadratic unconstrained binary optimization (QUBO) problem, which is easily implemented on these computers. For simplicity, we assume there exists a target image profile on the wafer. The target can be the image of an existing mask or a virtual ideal mask which may be designed as a pixelated mask having a continuous transmission distribution. The solution is evaluated as the difference between the simulated image profile on the wafer surface and the target profile.

Paper Details

Date Published: 23 March 2020
PDF: 11 pages
Proc. SPIE 11327, Optical Microlithography XXXIII, 1132705 (23 March 2020); doi: 10.1117/12.2550780
Show Author Affiliations
Yosuke Okudaira, Nikon Corp. (Japan)
Satoshi Yashiki, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 11327:
Optical Microlithography XXXIII
Soichi Owa, Editor(s)

© SPIE. Terms of Use
Back to Top
PREMIUM CONTENT
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?
close_icon_gray