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Proceedings Paper

Nanoscale grating characterization through EUV spectroscopy aided by machine learning techniques
Author(s): Lukas Bahrenberg; Sven Glabisch; Serhiy Danylyuk; Moein Ghafoori; Sophia Schröder; Sascha Brose; Jochen Stollenwerk; Peter Loosen
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Paper Abstract

In this contribution nanoscale gratings are characterized by means of broadband EUV spectroscopy with wavelengths from 10 nm to 15 nm. The study focuses on the specifics of this spectral range that can be beneficial for metrology applications in lithography. Experimental investigations are carried out on fused silica nanoscale line gratings in a stand-alone laboratory-based setup. A corresponding sensitivity study is carried out analyzing the influence of grating parameter variations on EUV reflectance curves. Subsequently, experimental uncertainties are propagated to accuracies of grating parameter extraction. Using rigorous simulations in combination with machine learning, limitations of the technique are discussed regarding industrially relevant gratings. Extending the method through analysis of higher diffraction orders is evaluated.

Paper Details

Date Published: 20 March 2020
PDF: 8 pages
Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 113250X (20 March 2020); doi: 10.1117/12.2550508
Show Author Affiliations
Lukas Bahrenberg, RWTH Aachen Univ. (Germany)
JARA- Fundamentals of Future Information Technology (Germany)
Sven Glabisch, RWTH Aachen Univ. (Germany)
JARA- Fundamentals of Future Information Technology (Germany)
Serhiy Danylyuk, Fraunhofer ILT (Germany)
Moein Ghafoori, RWTH Aachen Univ. (Germany)
JARA- Fundamentals of Future Information Technology (Germany)
Sophia Schröder, RWTH Aachen Univ. (Germany)
JARA- Fundamentals of Future Information Technology (Germany)
Sascha Brose, RWTH Aachen Univ. (Germany)
JARA- Fundamentals of Future Information Technology (Germany)
Jochen Stollenwerk, RWTH Aachen Univ. (Germany)
JARA- Fundamentals of Future Information Technology (Germany)
Fraunhofer ILT (Germany)
Peter Loosen, RWTH Aachen Univ. (Germany)
JARA- Fundamentals of Future Information Technology (Germany)
Fraunhofer ILT (Germany)


Published in SPIE Proceedings Vol. 11325:
Metrology, Inspection, and Process Control for Microlithography XXXIV
Ofer Adan; John C. Robinson, Editor(s)

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