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Proceedings Paper

Reproducible array image translation and recreation in nano photolithography
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Paper Abstract

Nano-arrays are an important structure for building chemical filters, photonic crystal waveguides, antireflection, or transmission devices. There are different methods of lithography to produce these nano-arrays, which include contact and projection photolithography, E-beam direct writing, and X-ray lithography. Contact photolithography is the most widely used method due to its simplicity and good for time and cost-saving. However, there are penalties that come with these benefits which include problems of generating Newton rings and difficulties of transferring patterns faithfully for situations at and beyond the diffraction limit.

In this work, we fabricated nano-arrays for high power antireflection applications using contact photolithography. Fortunately for the antireflection application, pattern periodicity is more important than obtaining the exact shape of the nanostructure. The fabricated structure, even though not the same as the original pattern, can still produce promising antireflection results. We have studied how the range of the distance between the mask and the photoresist affects the shapes of the produced patterns including holes, posts, and cones. The experimental results with different shapes and periodic patterns produced by different diffraction distances are explained with simulation results involving Fourier transformation and Fresnel diffraction of the mask patterns.

Paper Details

Date Published: 31 January 2020
PDF: 8 pages
Proc. SPIE 11288, Quantum Sensing and Nano Electronics and Photonics XVII, 1128824 (31 January 2020); doi: 10.1117/12.2550387
Show Author Affiliations
Rachit M. Sood, Univ. of Maryland, Baltimore County (United States)
Chaoran Tu, Univ. of Maryland, Baltimore County (United States)
Douglas Bamford, Physical Sciences Inc. (United States)
Joel Hensley, Physical Sciences Inc. (United States)
David Woolf, Physical Sciences Inc. (United States)
C. R. Menyuk, Univ. of Maryland, Baltimore County (United States)
Fow-Sen Choa, Univ. of Maryland, Baltimore County (United States)


Published in SPIE Proceedings Vol. 11288:
Quantum Sensing and Nano Electronics and Photonics XVII
Manijeh Razeghi; Jay S. Lewis; Giti A. Khodaparast; Pedram Khalili, Editor(s)

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