Share Email Print

Proceedings Paper

Study of lithographic characteristics due to differences in novolac resin structure
Author(s): Atsushi Sekiguchi; Hatsuyuki Tanaka D.D.S.; Hiroko Minami D.D.S.; Yoko Matsumoto D.D.S.; Makoto Hanabata D.D.S.
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Our earlier studies pointed to a strong correlation between the molecular weight of novolac resin and lithographic characteristics. In particular, they showed that the resolution and DOF characteristics of resists may be improved by controlling molecular weight distribution. The present study focuses on photoactive compound (PAC) structure and resin structure. This paper discusses the effects of differences in PAC ballast structure and the composition of m-cresol (metacresol), p-cresol (para-cresol), and xylenol, phenolic monomers that constitute novolac resin, on resolution and lithographic characteristics, based on development rates and resist pattern simulations.

Paper Details

Date Published: 23 March 2020
PDF: 13 pages
Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 113261S (23 March 2020); doi: 10.1117/12.2550317
Show Author Affiliations
Atsushi Sekiguchi, Litho Tech Japan Corp. (Japan)
Ritsumeikan Univ. (Japan)
Hatsuyuki Tanaka D.D.S., Merck Performance Materials Inc. (Japan)
Hiroko Minami D.D.S., Litho Tech Japan Corp. (Japan)
Yoko Matsumoto D.D.S., Litho Tech Japan Corp. (Japan)
Makoto Hanabata D.D.S., Osaka City Univ. (Japan)

Published in SPIE Proceedings Vol. 11326:
Advances in Patterning Materials and Processes XXXVII
Roel Gronheid; Daniel P. Sanders, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?