Share Email Print
cover

Proceedings Paper

Femtosecond pulse laser beam shaping and power control for free-space optical material properties measurements
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

With the development of lasers, laser sources have been well adopted in spectrophotometry and optical material measurement. Especially in the ultraviolet range, ultraviolet laser has broad application prospects in the fields of optical data storage, lithography, micromachining, photobiology and medical treatment. The previously used xenon lamps have limited reliability, high energy consumption, and poor beam direction stability. NIM's new facility uses Ti: sapphire lasers as a source of monochromatic beams. Femtosecond pulse lasers can be tuned in a wide spectral range via parametric oscillation and high efficiency frequency conversions. For (280-340) nm femtosecond pulses generated via two nonlinear conversion of a (680-1080) nm Ti:Sapphire laser, the average power can be well controlled from 1 mW to sub-nW level using a polarizer-based attenuator. The laser beam quality was significantly improved using a spatial filter consists of an objective lens, a silica optical fiber, and an off-axis parabolic reflective collimator. The spatial filter was mounted on a two-dimension linear stage to accommodate the spatial beam shift. A spatially stabilized, quality beam over (280-340) nm spectral range was obtained and suitable for free-space optical materials measurements.

Paper Details

Date Published: 12 March 2020
PDF: 6 pages
Proc. SPIE 11437, 2019 International Conference on Optical Instruments and Technology: Advanced Laser Technology and Applications, 114370U (12 March 2020); doi: 10.1117/12.2550279
Show Author Affiliations
Weimin Wang, China Jiliang Univ. (China)
National Institute of Metrology (China)
Yingwei He, National Institute of Metrology (China)
Houping Wu, National Institute of Metrology (China)
Yinuo Xu, China Jiliang Univ. (China)
National Institute of Metrology (China)
Xiangliang Liu, National Institute of Metrology (China)
Yangting Fu, National Institute of Metrology (China)
Xufeng Jing, China Jiliang Univ. (China)
Haiyong Gan, National Institute of Metrology (China)


Published in SPIE Proceedings Vol. 11437:
2019 International Conference on Optical Instruments and Technology: Advanced Laser Technology and Applications
Zhiyi Wei; Chunqing Gao; Pu Wang; Franz X, Kärtner; Stefan A. Weber, Editor(s)

© SPIE. Terms of Use
Back to Top
PREMIUM CONTENT
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?
close_icon_gray