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Proceedings Paper

Study on a monocentric lens with wide-field and high-resolution
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Paper Abstract

Optical design of an imager with wide field-of-view (FOV) and high-resolution utilizes a monocentric objective lens in conjunction with an array of secondary optical lenses to achieve good performance. An intermediate image with uniform residual aberration throughout a wide FOV is obtained on a curved surface by the monocentric objective lens and then relayed to a sensor array by the secondary optical lenses. In this paper, we focus on the study of the monocentric objective lens and the surface type of its obtained curved image. Firstly, the equation of focal length is determined by ray tracing. The achromatic condition is obtained through first-order aberration theory. Accordingly, the initial configuration of the monocentric objective lens is determined, including the surface radii and reasonable glass combination. Secondly, a detailed calculation of the image positions is performed. The results show that the image surface is spherical when the object distance is much larger than the focal length. But it is aspheric when the object distance is comparable to the focal length. Finally, a mono-centric lens is optimumly designed, with a visible working wavelength band of 480-640nm, a focal length of 100mm, a wide FOV of 140°, and a large f-number of 5. Through imaging simulation and the image performance evaluation with ZEMAX, the theoretical calculations are verified.

Paper Details

Date Published: 12 March 2020
PDF: 6 pages
Proc. SPIE 11434, 2019 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 114340Y (12 March 2020); doi: 10.1117/12.2548692
Show Author Affiliations
Jiahui Li, Soochow Univ. (China)
Didi Zhao, Soochow Univ. (China)
Yun Zhou, Soochow Univ. (China)
Yiqun Ji, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 11434:
2019 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments
Juan Liu; Baohua Jia; Xincheng Yao; Yongtian Wang; Takanori Nomura, Editor(s)

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