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EUV Extendibility at 0.33 and 0.55NA (Conference Presentation)
Author(s): Mark C. Phillips

Paper Abstract

Review of near and long term extension challenges for EUV lithography at 0.33 and 0.55NA. Focus on mask and infrastructure gaps + opportunities and a review of progress made in critical areas to support EUV extension.

Paper Details

Date Published: 17 October 2019
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Proc. SPIE 11147, International Conference on Extreme Ultraviolet Lithography 2019, 1114702 (17 October 2019); doi: 10.1117/12.2548654
Show Author Affiliations
Mark C. Phillips, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 11147:
International Conference on Extreme Ultraviolet Lithography 2019
Toshiro Itani; Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse, Editor(s)

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