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Proceedings Paper

An advanced and efficient methodology for process setup and monitoring by using process stability diagnosis in computational lithography
Author(s): Lijun Chen; Jun Zhu; Xuedong Fan; Haichang Zheng; Xiaolong Wang; Yancong Ge; Yu Zhang; Abhishek Vikram; Guojie Cheng; Hui Wang; Qing Zhang; Wenkui Liao
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Paper Abstract

The stability of photolithography process tool is the fundamental to the fabrication of semiconductor devices. Several process control methods are employed to qualify and then monitor every single process layer at the photolithography stage. The CDSEM (Critical Dimension Scanning Electron Microscope) measurements on metrology features and the optical inspection and DRSEM (Defect Review Scanning Electron Microscope) on device features for Process Window Qualification is part of the conventional process control. Here we employed a novel PSD (Process Stability Diagnosis) solution that provides detailed Bossung plot like analysis on device features using CDSEM or DRSEM images. This provides quick insight into the process behavior and also identifies the root cause for any deviation. In this paper we will discuss about monitoring the depth of focus and the best focus as well as diagnosis for lens parameters like astigmatism and spherical aberration. We describe the method of extracting relevant parameters from high resolution images and establishing an automatic monitor for these critical indicators.

Paper Details

Date Published: 23 March 2020
PDF: 7 pages
Proc. SPIE 11328, Design-Process-Technology Co-optimization for Manufacturability XIV, 113280Z (23 March 2020); doi: 10.1117/12.2548377
Show Author Affiliations
Lijun Chen, Shanghai Huali Microelectronics Corp. (China)
Jun Zhu, Shanghai Huali Microelectronics Corp. (China)
Xuedong Fan, Shanghai Huali Microelectronics Corp. (China)
Haichang Zheng, Shanghai Huali Microelectronics Corp. (China)
Xiaolong Wang, Shanghai Huali Microelectronics Corp. (China)
Yancong Ge, Shanghai Huali Microelectronics Corp. (China)
Yu Zhang, Shanghai Huali Microelectronics Corp. (China)
Abhishek Vikram, Anchor Semiconductor, Inc. (United States)
Guojie Cheng, Anchor Semiconductor, Inc. (China)
Hui Wang, Anchor Semiconductor, Inc. (China)
Qing Zhang, Anchor Semiconductor, Inc. (China)
Wenkui Liao, Anchor Semiconductor, Inc. (China)


Published in SPIE Proceedings Vol. 11328:
Design-Process-Technology Co-optimization for Manufacturability XIV
Chi-Min Yuan, Editor(s)

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