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Proceedings Paper

Residual stress measurement of glass based on Muller matrix ellipsometer
Author(s): Jiahua Yu; Changcai Cui
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Paper Abstract

In order to measure the residual stress in flat glasses accurately, a new method based on Muller matrix ellipsometer is proposed. Under the transmission mode of ellipsometer, the sample with residual stress can be equivalent to a planar stress model in the direction perpendicular to the incident light. According to the stress-optic law, the magnitude of residual stress can be obtained according to the phase delay induced by residual stress in the sample. First, the phase delay can be calculated from the Muller matrix elements. Then the stress birefringence can be obtained in line with the thickness and the measuring wavelength. Finally, the residual stress can be carried out by dividing the photoelastic coefficient. The residual stress of quartz glass with a diameter of 20mm and a thickness of 3mm is measured. The phase accuracy of the ellipsometer reaches 0.1°. The measurement results of ellipsometer are in good agreement with those of dual-frequency laser interferometer, which has a higher phase accuracy than the ellipsometer. The experiment results indicate that Mueller matrix ellipsometer can be used as a new tool for high-precision, non-destructive measurement of residual stress.

Paper Details

Date Published: 13 November 2019
PDF: 6 pages
Proc. SPIE 11343, Ninth International Symposium on Precision Mechanical Measurements, 113430O (13 November 2019); doi: 10.1117/12.2548286
Show Author Affiliations
Jiahua Yu, Huaqiao Univ. (China)
Changcai Cui, Huaqiao Univ. (China)


Published in SPIE Proceedings Vol. 11343:
Ninth International Symposium on Precision Mechanical Measurements
Liandong Yu, Editor(s)

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