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Partial coherence measurement for the illumination system in excimer laser lithography based on CCD image sensor
Author(s): Pei Lu; Xiaoyong Liu; Qin Shi; Jianxin Shao; Yongcai Zhang; Zhenzhen Zheng
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Paper Abstract

Partial coherence is one of the important parameters for evaluating the performance of lithographic tool. In this paper, we present a novel method of partial coherence measurement for the illumination system based on CCD image sensor. Partial coherence measurement can be performed by using a pinhole placed in the mask plane under different illumination system. We simulate the light source image of different illumination pupil distributions as well as the energy center by determining the gray value of spot. We show measurement values and measurement errors of partial coherence for illumination system. The statistics of the measurement results and the sensitivity analysis of the system indicate that measurement values and measurement errors of partial coherence satisfy the measurement requirement from our method in the wafer plane.

Paper Details

Date Published: 20 December 2019
PDF: 6 pages
Proc. SPIE 11209, Eleventh International Conference on Information Optics and Photonics (CIOP 2019), 112091V (20 December 2019); doi: 10.1117/12.2547679
Show Author Affiliations
Pei Lu, Shihezi Univ. (China)
Xiaoyong Liu, Shihezi Univ. (China)
Qin Shi, Shihezi Univ. (China)
Jianxin Shao, Shihezi Univ. (China)
Yongcai Zhang, Shihezi Univ. (China)
Zhenzhen Zheng, Shihezi Univ. (China)


Published in SPIE Proceedings Vol. 11209:
Eleventh International Conference on Information Optics and Photonics (CIOP 2019)
Hannan Wang, Editor(s)

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