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Proceedings Paper

Wave front phase imaging of wafer geometry using high pass filtering to reveal nanotopography
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Paper Abstract

In this paper we show that Wave Front Phase Imaging (WFPI) has high lateral resolution and high sensitivity enabling it to measure nanotopography and roughness on a silicon wafer by simply acquiring a single image of the entire wafer. WFPI is achieved by measuring the reflected light intensity from monochromatic uncoherent light at two different planes along the optical path with the same field of view. We show that the lateral resolution in the current system used for these experiments is 24μm but can be pushed to less than 5μm by simply adding more pixels to the image sensor, and that the amplitude resolution limit is 0.3nm. Three 2-inch unpatterned silicon wafers were measured, and the nanotopography and roughness was revealed by applying a double Gaussian high pass filter to the global topography data.

Paper Details

Date Published: 2 March 2020
PDF: 11 pages
Proc. SPIE 11287, Photonic Instrumentation Engineering VII, 112870W (2 March 2020);
Show Author Affiliations
J. M. Trujillo-Sevilla, Wooptix (Spain)
J. M. Ramos-Rodríguez, Wooptix (Spain)
J. Gaudestad, Wooptix (United States)


Published in SPIE Proceedings Vol. 11287:
Photonic Instrumentation Engineering VII
Yakov Soskind; Lynda E. Busse, Editor(s)

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