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Proceedings Paper

In-situ absolute measurement method for reference surface error of large aperture interferometer based on oblique incidence
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Paper Abstract

Existing absolute measurement methods are difficult to avoid the replacement and rotation of the large aperture interferometer’s reference flat, and it is impossible to achieve in-situ absolute measurement on the basis of keeping the reference flat of the interferometer not rotating and replacing each other. In this paper, a test method based on oblique incidence is practically implemented in the interferometric measurement process, and an auxiliary rotating device for large aperture flat is designed. Three sets of wavefront data are achieved through cavity interference measurement with a Fizeau interferometer and one oblique incidence measurement. An iterative algorithm is applied to retrieve the absolute surface shape of the test flat. The absolute measurement experiment is carried out on the 600-mm aperture interferometer produced by Zygo. The experimental results show that the absolute surface error of the reference flat measured according to the proposed method is 2.0 nm (RMS), differing from the absolute measurement results based on the Zygo approach.

Paper Details

Date Published: 20 December 2019
PDF: 6 pages
Proc. SPIE 11209, Eleventh International Conference on Information Optics and Photonics (CIOP 2019), 112091K (20 December 2019); doi: 10.1117/12.2547402
Show Author Affiliations
You Zhou, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)
Shijie Liu, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)
Yunbo Bai, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)
Longbo Xu, Nanjing Univ. of Science and Technology (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 11209:
Eleventh International Conference on Information Optics and Photonics (CIOP 2019)
Hannan Wang, Editor(s)

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