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Laser processing of plasmonic metal oxides and phase change materials
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Paper Abstract

Plasmonic materials have attracted great attention due to their ability to enhance light-matter interactions. Noble metals such as Au and Ag have been well studied as materials for plasmonic devices. However, these metals are not suitable for mid infrared (IR) plasmonic applications due to their relatively large optical losses, which are detrimental to device efficiency. Metal oxides, on the other hand, have been proposed for low loss metallic components in the mid IR because they can provide a tunable carrier density by varying the concentration of dopants or defects (oxygen vacancies). The epsilon-near zero wavelength of the real part of the dielectric permittivity of these metal oxides, for example, can easily be tuned from 1.5 μm to 4 μm by adjusting doping or defect levels. Optical losses in devices made from these metal oxide materials generally exhibit lower losses than those obtained with conventional metals. We have investigated laser processing techniques for synthesizing several types of metal oxides such as indium tin oxide and phase change materials such as VO2. First, pulsed laser deposition was used to grow these oxide thin films. Second, an ultrafast laser was used to spatially pattern the thin films via a direct laser interference patterning (DLIP) configuration while simultaneously producing laser induced periodic surface structures (LIPSS) resulting in a uniaxial surface morphology. We will present details of the laser processing conditions on surface morphology, electrical, and optical properties of these laser processed metal oxide films.

Paper Details

Date Published: 2 March 2020
PDF: 8 pages
Proc. SPIE 11268, Laser-based Micro- and Nanoprocessing XIV, 1126816 (2 March 2020); doi: 10.1117/12.2546933
Show Author Affiliations
Heungsoo Kim, Naval Research Lab. (United States)
Nicholas A. Charipar, Naval Research Lab. (United States)
Raymond C. Y. Auyeung, Naval Research Lab. (United States)
Kristin M. Charipar, Naval Research Lab. (United States)
Alberto Piqué, Naval Research Lab. (United States)

Published in SPIE Proceedings Vol. 11268:
Laser-based Micro- and Nanoprocessing XIV
Udo Klotzbach; Akira Watanabe; Rainer Kling, Editor(s)

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