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Proceedings Paper

Plasmonic nanostructures for enhanced performance of microcrystalline silicon solar cells
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Paper Abstract

Due to the high cost of conventional crystalline silicon solar cells, researchers have been attracted towards the development of thin-film Si solar cells, where a several hundred nanometers thick amorphous Si (a-Si) or microcrystalline Si (μc-Si) solar cell layer is deposited by plasma-enhanced chemical vapor deposition (PECVD). This paper presents the use of plasmonic nanostructures in μc-Si p-i-n junction thin-film solar cells to increase the absorption in a broad spectral range. Finite-difference time-domain (FDTD) simulation results demonstrate a broadband absorption enhancement in these solar cells due to plasmonic nanostructures. The enhancement in the absorption is attributed to the enhanced electromagnetic fields in the active layer due to the excitation of surface plasmon modes and photonic Bloch modes at multiple wavelengths. Moreover, the plasmonic nanostructures lead to a significant enhancement in the shortcircuit current density of the μc-Si thin-film solar cell.

Paper Details

Date Published: 3 March 2020
PDF: 7 pages
Proc. SPIE 11275, Physics, Simulation, and Photonic Engineering of Photovoltaic Devices IX, 112751E (3 March 2020); doi: 10.1117/12.2546804
Show Author Affiliations
Uttam K. Kumawat, Indian Institute of Technology Delhi (India)
Rajiv Gandhi Government P.G. College (India)
Akanksha Ninawe, Indian Institute of Technology Delhi (India)
Kamal Kumar, Indian Institute of Technology Delhi (India)
Anuj Dhawan, Indian Institute of Technology Delhi (India)

Published in SPIE Proceedings Vol. 11275:
Physics, Simulation, and Photonic Engineering of Photovoltaic Devices IX
Alexandre Freundlich; Masakazu Sugiyama; Stéphane Collin, Editor(s)

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