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Proceedings Paper

Microscope projection photolithography of polymeric optical micro- and nanocomponents
Author(s): Lei Zheng; Carsten Reinhardt; Bernhard Roth
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Paper Abstract

Lithography is one of the key technologies employed for the fabrication of optical devices and components, which could be applied in fields as diverse as optical sensing, communication and information technologies. Microscope projection photolithography (MPP), as a low-cost, simple and flexible lithography method, lends itself for versatile applications. Its feasibility in realizing various microstructures has been verified already. However, the improvement of the quality and resolution of structures still remains challenging. Here, we present an MPP method for the controlled generation of high-quality and high-resolution 2D optical micro- and nanostructures. Particularly, an improved process chain, which significantly shortens the time from structure design to the realization to less than one day, is introduced. The structures, first designed with vector-graphics software, are printed on a commercial transparency film. Then, the film is placed into a self-developed setup, and the structure patterns are transferred onto a chromium photomask with a demagnification of 10:1, for example. The last step is to place the chromium photomask into the MPP arrangement and implement the fabrication using a microscope objective to demagnify and project structure patterns onto photoresist which is simultaneously exposed to UV light. With this process chain, periodic structures with a minimum feature size of 150 nm were realized using an objective with NA of 1.4. Furthermore, various photonic components such as micro ring resonators and arrayed waveguide gratings with high quality were generated with application potential, e. g. in sensing and monitoring.

Paper Details

Date Published: 28 February 2020
PDF: 7 pages
Proc. SPIE 11292, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII, 112920Q (28 February 2020); doi: 10.1117/12.2546679
Show Author Affiliations
Lei Zheng, Leibniz Univ. Hannover (Germany)
Cluster of Excellence PhoenixD (Germany)
Carsten Reinhardt, Hochschule Bremen (Germany)
Bernhard Roth, Leibniz Univ. Hannover (Germany)
Cluster of Excellence PhoenixD (Germany)


Published in SPIE Proceedings Vol. 11292:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII
Georg von Freymann; Eva Blasco; Debashis Chanda, Editor(s)

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