Share Email Print
cover

Proceedings Paper

172 nm patterning of optical components on polymers (Conference Presentation)
Author(s): Andrey E. Mironov; Dane J. Sievers; Austin W. Steinforth; Jinhong Kim; Sung-Jin Park; James G. Eden

Paper Abstract

Gratings, Fresnel lenses, phase masks, and waveguides are among the optical components that have been fabricated by 172 nm irradiation of various polymers through photomasks. Intensities above ~ 70 mW/cm^2 are now commercially available at 172 nm with flat Xe2 lamps. Such optical fluences are capable of precisely (< 500 nm lateral and 20 nm depth resolution) ablating a wide range of polymers, including PMMA and ABS, thereby allowing for a variety of 3D optical and biomedical components to be realized economically by dry processing.

Paper Details

Date Published: 10 March 2020
PDF
Proc. SPIE 11292, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII, 112920T (10 March 2020); doi: 10.1117/12.2546426
Show Author Affiliations
Andrey E. Mironov, Univ. of Illinois (United States)
Cygnus Photonics (United States)
Dane J. Sievers, Univ. of Illinois (United States)
Cygnus Photonics (United States)
Austin W. Steinforth, Univ. of Illinois (United States)
Jinhong Kim, Univ. of Illinois (United States)
Sung-Jin Park, Univ. of Illinois (United States)
Cygnus Photonics (United States)
James G. Eden, Univ. of Illinois (United States)
Cygnus Photonics (United States)


Published in SPIE Proceedings Vol. 11292:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII
Georg von Freymann; Eva Blasco; Debashis Chanda, Editor(s)

© SPIE. Terms of Use
Back to Top
PREMIUM CONTENT
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?
close_icon_gray