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Proceedings Paper

Optical waveguide on silicon made by zone melting method
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Paper Abstract

In this paper we introduce a novel method of making micro-waveguides on silicon surface by the use of the Zone Refining Method. We produce the melting zone by a laser beam focused on the surface of a doped silicon slab to create a melting spot on its surface. By moving the melt zone across the silicon sample we can write a path of higher index of refraction on the silicon. The depth and the width of the waveguide can be determined by the wavelength and the spot diameter of the laser, respectively. We demonstrate the production of 1X4 μm2 channel on the silicon, by using 532 nm laser beam. This method can be applied in microelectronics for the manufacture of light waveguides on integrated optoelectronics ICs.

Paper Details

Date Published: 2 March 2020
PDF: 7 pages
Proc. SPIE 11267, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXV, 1126706 (2 March 2020); doi: 10.1117/12.2545949
Show Author Affiliations
Uriel Hanuka, Bar-Ilan Univ. (Israel)
Yair Zigman, Bar-Ilan Univ. (Israel)
Maor Tiferet, Bar-Ilan Univ. (Israel)
Zeev Zalevsky, Bar-Ilan Univ. (Israel)
Moshe Sinvani, Bar-Ilan Univ. (Israel)

Published in SPIE Proceedings Vol. 11267:
Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXV
Gediminas Račiukaitis; Carlos Molpeceres; Jie Qiao; Aiko Narazaki, Editor(s)

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