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Proceedings Paper

Processing bulk silicon with femtosecond laser pulses at 2-µm wavelength (Conference Presentation)
Author(s): Maxime Chambonneau; Markus Blothe; Vladimir Yu. Fedorov; Tobias Heuermann; Gabor Matthäus; Alessandro Alberucci; Jens Limpert; Stylianos Tzortzakis; Stefan Nolte

Paper Abstract

We investigate the possibilities offered by tightly focused ultrashort laser pulses at 2-µm wavelength for modifying the bulk of silicon. Results show that the lower the pulse duration, the lower the probability to modify the material, in good agreement with nonlinear propagation simulations. By evaluating the influence of several laser parameters, we have found ideal conditions for successfully initiating modifications systematically in the bulk of silicon with ultrashort laser pulses through plane surface for the first time. This result holds promises for contactless monolithic integration of three-dimensional architectures inside silicon.

Paper Details

Date Published: 9 March 2020
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Proc. SPIE 11270, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XX, 112700E (9 March 2020); doi: 10.1117/12.2545820
Show Author Affiliations
Maxime Chambonneau, Friedrich-Schiller-Univ. Jena (Germany)
Markus Blothe, Friedrich-Schiller-Univ. Jena (Germany)
Vladimir Yu. Fedorov, Texas A&M Univ. at Qatar (Qatar)
P. N. Lebedev Physical Institute of the RAS (Russian Federation)
Tobias Heuermann, Friedrich-Schiller-Univ. Jena (Germany)
Gabor Matthäus, Friedrich-Schiller-Univ. Jena (Germany)
Alessandro Alberucci, Abbe Ctr. of Photonics (Germany)
Jens Limpert, Friedrich-Schiller-Univ. Jena (Germany)
Helmholtz-Institute Jena (Germany)
Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Stylianos Tzortzakis, Texas A&M Univ. at Qatar (Qatar)
Foundation for Research and Technology-Hellas (Greece)
Univ. of Crete (Greece)
Stefan Nolte, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 11270:
Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XX
Peter R. Herman; Michel Meunier; Roberto Osellame, Editor(s)

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